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Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/Deposition of Silicon Oxide using LPCVD TEOS: Difference between revisions

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!Comments
!Comments
|-  
|-  
|"NITRIDE"
|"TEOSPNE"
|4" wafers
|4" wafers
1-17 wafers in a run
1-17 wafers in a run
Line 28: Line 28:
|Stoichiometric nitride
|Stoichiometric nitride
|-
|-
|"SIRICH"
|"TEOSSLOW"
|4" wafers
|4" wafers
1-17 wafers in a run
1-17 wafers in a run
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