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Specific Process Knowledge/Thin film deposition/Deposition of Silicon Nitride/Deposition of Silicon Nitride using PECVD: Difference between revisions

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Jmli (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
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== Deposition of SiN with PECVD4 ==
== Deposition of SiN with PECVD4 ==
{| border="1" cellspacing="2" cellpadding="2" colspan="3"
{| border="1" cellspacing="2" cellpadding="2" colspan="3"
|bgcolor="#98FB98" |'''Quality Controle (QC) for PECVD4 [[Image:section under construction.jpg|70px]] '''
|bgcolor="#98FB98" |'''Quality Control (QC) for PECVD4 [[Image:section under construction.jpg|70px]] '''
|-
|-
|
|
*[http://labmanager.danchip.dtu.dk/d4Show.php?id=1402&mach=395 The QC procedure for PECVD4]<br>
*[http://labmanager.dtu.dk/d4Show.php?id=1402&mach=395 The QC procedure for PECVD4]<br>
*[http://www.labmanager.dtu.dk/view_binary.php?type=data&mach=106 The newest QC data for PECVD3]<br>
*[http://www.labmanager.dtu.dk/view_binary.php?type=data&mach=106 The newest QC data for PECVD3]<br>
{| {{table}}
{| {{table}}
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!PECVD4
!PECVD4
|-
|-
|Depoition rate
|Deposition rate
|~ 11.6 nm/min
|~ 11.6 nm/min
|-
|-
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