LabAdviser/Technology Research/Technology Development of 3D Silicon Plasma Etching process for Novel Devices and Applications: Difference between revisions
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* [[Specific_Process_Knowledge/Lithography/EBeamLithography/High resolution patterning with HSQ|High resolution patterning with HSQ]] | * [[Specific_Process_Knowledge/Lithography/EBeamLithography/High resolution patterning with HSQ|High resolution patterning with HSQ]] | ||
==Galleries== | |||
<gallery caption="Fabricated metamaterials based on Al-doped ZnO (AZO). Measurements performed using Fourier Trasform Infrared Spectroscopy (FTIR)." widths="500px" heights="500px" perrow="4"> | |||
image:AZO_Air_trench_SEM.jpg| AZO trenches in air host. SEM image, bird-eye-view. | |||
image:AZO_Si_trench_SEM.jpg| AZO trenches in Si host. SEM image, bird-eye-view. | |||
image:pillars.jpg| AZO pillars. SEM image, bird-eye-view. | |||
image:tubes.jpg| AZO tubes. SEM image, bird-eye-view. | |||
</gallery> | |||
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