Specific Process Knowledge/Thin film deposition/Deposition of Silicon Nitride/Deposition of Silicon Nitride using PECVD: Difference between revisions
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|~2.1 (''bghe Feb 2016'') | |~2.1 (''bghe Feb 2016'') | ||
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|[[/PECVD3: Low stress nitride testing|see | |[[/PECVD3: Low stress nitride testing|see more results]] | ||
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|MFSiNLS | |MFSiNLS | ||
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==Recipes on PECVD2 for deposition of silicon nitride and silicon oxynitride == | ==Recipes on PECVD2 for deposition of silicon nitride and silicon oxynitride == | ||