LabAdviser/Technology Research/Organic Ice Resists for Electron-Beam Lithography - Instrumentation and Processes/Electron-Beam Lithography on Organic Ice Resists: Difference between revisions
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=Electron-Beam Lithography on Organic Ice Resists= | =Electron-Beam Lithography on Organic Ice Resists= | ||
[[image:ProcessOIR.png|500px|thumb|Lithography process for Organic Ice Resists]] | |||
Simple organic molecules, e.g. alcohols, condensed to form thin-films at low temperature demonstrate resist-like capabilities for EBL applications and beyond. The entire lithographic process takes place in a single instrument, and avoids exposing users to chemicals and the need of cleanrooms. Unlike EBL that requires large samples with optically flat surfaces, we patterned on fragile membranes only 5 nm-thin, and 2×2 mm2 diamond samples. We created patterns on the nanometer to sub-millimeter scale, as well as three-dimensional structures by stacking layers of frozen organic molecules. Finally, using plasma etching, the organic ice resist (OIR) patterns are used to structure the underlying material, and thus enable nanodevice fabrication. | |||
==Overview== | ==Overview== | ||
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==Organic Ice Resists== | ==Organic Ice Resists== | ||
==Contrast Curve== | ==Contrast Curve== | ||