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LabAdviser/Technology Research/Fabrication of Hyperbolic Metamaterials using Atomic Layer Deposition/AZO gratings: Difference between revisions

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== Process flow ==
== Process flow ==
Description of steps for fabrication of TiO<sub>2</sub> and AL<sub>2</sub>O<sub>3</sub> nanogratings.
Description of steps for fabrication of AZO nanogratings.


{| border="1" cellspacing="1" cellpadding="3" style="text-align: left; width: 925px; height: 220px;"
{| border="1" cellspacing="1" cellpadding="3" style="text-align: left; width: 925px; height: 220px;"
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!1.10
!1.10
|Selective etch of Si between ALD  AZO coatings.
|Selective etch of Si between ALD  AZO coatings.
|Si etching proceeds using ICP Metal etcher with isotropic  process based on SF<sub>6</sub> process gas.
|Si etching proceeds using reactive ion etching with isotropic  process based on SF<sub>6</sub> process gas.
||Equipment used: [[Specific_Process_Knowledge/Etch/RIE_(Reactive_Ion_Etch)|RIE2]].
||Equipment used: [[Specific_Process_Knowledge/Etch/RIE_(Reactive_Ion_Etch)|RIE2]].
|[[image:06_ALD_eves.jpg|250x350px|center]]
|[[image:06_ALD_eves.jpg|250x350px|center]]
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