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Specific Process Knowledge/Thin film deposition/Deposition of Silicon Nitride/Deposition of Silicon Nitride using PECVD: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
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|Comments
|Comments
|-  
|-  
|1nitride
|SINSTD80
|68nm/min (2014-07-07 JML)
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|SINSTD96
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|1nit_std
|~32
|1.89
|~1
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|~700
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|-
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