Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/SiO2 disk and granule source tests in Temescal October 2026: Difference between revisions
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Near 587-589 nm, Run 1 recorded a rate excursion up to 7.8 Å/s while power fell to about 2.8%, followed by recovery. This occurred well after the final restart and is retained in the main curve. The log alone cannot assign it to beam repositioning, source reshaping or another specific cause. | Near 587-589 nm, Run 1 recorded a rate excursion up to 7.8 Å/s while power fell to about 2.8%, followed by recovery. This occurred well after the final restart and is retained in the main curve. The log alone cannot assign it to beam repositioning, source reshaping or another specific cause. | ||
== Processing | == Processing interpretation == | ||
[[File:Eves_SiO2_Temescal_202610_Fig09_Power_active_time.png|thumb|center|900px|Figure 9. Power plotted against cumulative time in the sustained DEPOSIT phases. Alarm pauses (caused by a recipe condition that issues an alarm message after 30 min of continuous heat; the value is corrected to 300 min for Run2) and conditioning are removed from the time axis. The first 120 s after each restart remain as gaps in the curve; those seconds are still part of the deposition-phase clock. This time axis differs from elapsed wall-clock time. All-phase wall-clock plots and the complete raw records are included in the accompanying package.]] | [[File:Eves_SiO2_Temescal_202610_Fig09_Power_active_time.png|thumb|center|900px|Figure 9. Power plotted against cumulative time in the sustained DEPOSIT phases. Alarm pauses (caused by a recipe condition that issues an alarm message after 30 min of continuous heat; the value is corrected to 300 min for Run2) and conditioning are removed from the time axis. The first 120 s after each restart remain as gaps in the curve; those seconds are still part of the deposition-phase clock. This time axis differs from elapsed wall-clock time. All-phase wall-clock plots and the complete raw records are included in the accompanying package.]] | ||
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No smoothing, outlier removal or thickness rescaling is applied to the remaining points. Original record order and small reversals in the thickness indication are preserved. The package includes the unfiltered wall-clock plots and all records. Cumulative deposition-phase time is about 101.33 min for Run 1 and 99.87 min for Run 2; the separate shutter-open counters are each 3 s shorter. | No smoothing, outlier removal or thickness rescaling is applied to the remaining points. Original record order and small reversals in the thickness indication are preserved. The package includes the unfiltered wall-clock plots and all records. Cumulative deposition-phase time is about 101.33 min for Run 1 and 99.87 min for Run 2; the separate shutter-open counters are each 3 s shorter. | ||
== Conclusions and next experiments == | == Conclusions and next experiments == | ||