Specific Process Knowledge/Thin film deposition/Deposition of Vanadium Nitride/VN Reactive Sputtering in Cluster Lesker PC1: Difference between revisions
Created page with "<i>This page was written by <b>Evgeniy Shkondin, DTU Nanolab</b>, unless otherwise stated.<br> All images and photographs on this page belong to <b>DTU Nanolab</b>.<br> The fabrication and characterization described below were carried out in <b>2026 by Evgeniy Shkondin, DTU Nanolab</b>.<br></i> =Vanadium Nitride p-DC Reactive Sputtering= This document presents the development and characterization of vanadium nitride (<b>VN<sub>x</sub></b>) thin films deposited by react..." |
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==Additional characterization and complete results== | ==Additional characterization and complete results== | ||
A complete GiXRD description, including the original diffraction patterns and detailed peak assignments, together with the full XPS composition analysis, REELS results and supporting figures, is available on the corresponding internal LabIntra page. For further information, access to the complete data set or a discussion of the results, please contact <b>Evgeniy Shkondin, DTU Nanolab</b>. | A complete GiXRD description, including the original diffraction patterns and detailed peak assignments, together with the full XPS composition analysis, REELS results and supporting figures, is available on the corresponding internal <b>LabIntra page</b>. For further information, access to the complete data set or a discussion of the results, please contact <b>Evgeniy Shkondin, DTU Nanolab</b>. | ||