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Specific Process Knowledge/Thin film deposition/Deposition of Tungsten/Sputtering of W in Sputter Coater 3: Difference between revisions

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Eves (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,346 edits
Eves (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,346 edits
Tag: Manual revert
Line 25: Line 25:
The maximum time the user can select is 300 seconds, so if longer depositions are needed, the user must redo them several times to achieve the expected thickness.
The maximum time the user can select is 300 seconds, so if longer depositions are needed, the user must redo them several times to achieve the expected thickness.


<gallery caption="Big glass chamber setup." widths="400px" heights="350px" perrow="2">
<gallery caption="Big glass chamber setup." widths="500px" heights="500px" perrow="2">
image:eves_W_sputter_coater_3_big_glass_01_20220914.png| Big glass configuration.
image:eves_W_sputter_coater_3_big_glass_01_20220914.png| Big glass configuration.
image:eves_W_sputter_coater_3_big_glass_02_20220914.png| Big (15 cm) and small (6.5 cm) glass chambers.
image:eves_W_sputter_coater_3_big_glass_02_20220914.png| Big (15 cm) and small (6.5 cm) glass chambers.
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