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Specific Process Knowledge/Thin film deposition/Deposition of Tungsten/Sputtering of W in Sputter Coater 3: Difference between revisions

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Eves (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
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</gallery>
</gallery>


<gallery caption="XPS scans." widths="500px" heights="400px" perrow="2">
<gallery caption="XPS scans." widths="400px" heights="350px" perrow="2">
image:eves_W_sputter_coater_3_big_glass_XPS_Survey_0s_80mA_300s_20220915.png| Survey scan.
image:eves_W_sputter_coater_3_big_glass_XPS_Survey_0s_80mA_300s_20220915.png| Survey scan.
image:eves_W_sputter_coater_3_big_glass_XPS_Survey_20s_80mA_300s_20220915.png| Survey scan after 20s of Ar etch.
image:eves_W_sputter_coater_3_big_glass_XPS_Survey_20s_80mA_300s_20220915.png| Survey scan after 20s of Ar etch.
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