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Specific Process Knowledge/Thin film deposition/Deposition of Tungsten/Sputtering of W in Sputter Coater 3: Difference between revisions

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The fabrication and characterization described below were conducted in <b>2022 by Evgeniy Shkondin, DTU Nanolab</b>. The prepared samples were investigated by the X-ray Reflectivity (XRR), Scanning Electron Microscopy (SEM) and Photo Electron Spectroscopy (XPS) methods. The focus of the study was the deposition conditions.
The fabrication and characterization described below were conducted in <b>2022 by Evgeniy Shkondin, DTU Nanolab</b>. The prepared samples were investigated by the X-ray Reflectivity (XRR), Scanning Electron Microscopy (SEM) and Photo Electron Spectroscopy (XPS) methods. The focus of the study was the deposition conditions.
<b>It is recommended to clean the target with fine sandpaper to remove the native oxide if the target was not used for a long time.</b>




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