Specific Process Knowledge/Thin film deposition/Cluster-based multi-chamber high vacuum sputtering deposition system: Difference between revisions
| Line 627: | Line 627: | ||
A sample transferring can be done while the sample is hot but not while the heater is on. The heater thermocouples will cool very rapidly as soon as the heater is turned off so there is no set temperature. A sample transfer unload should be done when the temperature is below 300 degrees Celsius. | A sample transferring can be done while the sample is hot but not while the heater is on. The heater thermocouples will cool very rapidly as soon as the heater is turned off so there is no set temperature. A sample transfer unload should be done when the temperature is below 300 degrees Celsius. | ||
There are dedicated recipes to turn on a heater: | There are dedicated recipes to turn on a heater: | ||