LabAdviser/Technology Research/Technology Development of 3D Silicon Plasma Etching process for Novel Devices and Applications: Difference between revisions
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:Oral presentation at 44rd International conference on Micro and Nano Engineering, Copenhagen, Denmark (2018) | :Oral presentation at 44rd International conference on Micro and Nano Engineering, Copenhagen, Denmark (2018) | ||
==Student projects== | |||
*;'''High Resolution Pattern Definition with Electron Beam Lithography''' | |||
:Mikro 3W, course no. 33470 (June 2016) | |||
*;'''Precise Timing Control in Deep Reactive Ion Etching (DRIE) with Bosch Process''' | |||
:Mikro 3W, course no. 33470 (January 2017) | |||
*;'''Using the Black Silicon Method to Monitor the Reproducibility of Plasma Etching Processes''' | |||
:Mikro 3W, course no. 33470 (July 2017) | |||