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Specific Process Knowledge/Thin film deposition/Deposition of Silicon Nitride/Deposition of Silicon Nitride using PECVD: Difference between revisions

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|-
|MF SIN<!-- Recipe -->
|MF SIN<!-- Recipe -->
|12.9-13.0 nm/min<!-- Dep. rate [nm/min] -->
|12.9-13.0 nm/min <br> 11.7 nm/min (''kabi 2019-03-01'')<!-- Dep. rate [nm/min] -->
|2.038-2.044<!-- RI -->
|2.038-2.044<!-- RI -->
|&plusmn; 1.7%<!-- Unif. [%] -->
|&plusmn; 1.7%<!-- Unif. [%] -->
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