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Specific Process Knowledge/Thin film deposition/Deposition of Silicon Nitride/Deposition of Silicon Nitride using PECVD: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
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Bghe (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
7,324 edits
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|SINSTD80
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|68nm/min (2014-07-07 JML)
|68nm/min (2014-07-07 JML)- unstable deposition rate
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|SINSTD96
|SINSTD96 - unstable deposition rate
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