Specific Process Knowledge/Thin film deposition/Deposition of Silicon Nitride/Deposition of Silicon Nitride using PECVD: Difference between revisions
Appearance
| Line 30: | Line 30: | ||
|550 | |550 | ||
|60 | |60 | ||
| | |||
|- | |||
|1SiN | |||
| | |||
| | |||
| | |||
| | |||
| | |||
| | | | ||
|- | |- | ||
Bghe (talk | contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators 7,324 edits |
Bghe (talk | contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators 7,324 edits |
||
| Line 30: | Line 30: | ||
|550 | |550 | ||
|60 | |60 | ||
| | |||
|- | |||
|1SiN | |||
| | |||
| | |||
| | |||
| | |||
| | |||
| | | | ||
|- | |- | ||