Jump to content

Specific Process Knowledge/Thermal Process/Oxidation/Breakdown voltage measurements/A2 furnace break-down voltage measurement results: Difference between revisions

From LabAdviser
Pevo (talk | contribs)
Created page with "==Breakdown voltage results for the A2 Gate Oxide furnace== ===Dry oxidation=== {| border="2" cellspacing="2" cellpadding="5" style="text-align: center;" |- |'''Date''' |'''Oxidation recipe''' |'''Oxide thickness''' |'''Absolute break-down voltage''' |'''Relative break-down voltage''' |- |'''February 2022''' |DRY1050 |150 nm |350x350px|thumb|left |image:2022-02-08_10-56-57_Wafer_A2_150nm_Rel.png|350x350px|thumb|le..."
 
Pevo (talk | contribs)
No edit summary
Line 10: Line 10:
|'''Absolute break-down voltage'''
|'''Absolute break-down voltage'''
|'''Relative break-down voltage'''
|'''Relative break-down voltage'''
<i>= Absolute break-down voltage/oxide thickness<i>
|-
|-
|'''February 2022'''
|'''February 2022'''

Revision as of 12:41, 16 September 2025

Breakdown voltage results for the A2 Gate Oxide furnace

Dry oxidation

Date Oxidation recipe Oxide thickness Absolute break-down voltage Relative break-down voltage

= Absolute break-down voltage/oxide thickness

February 2022 DRY1050 150 nm
November 2023 DRY1100 585 nm
January 2024 DRY1050 226 nm