Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/SiO2 disk and granule source tests in Temescal October 2026: Difference between revisions
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Experimental work and documentation: '''Evgeniy Shkondin, DTU Nanolab'''. Rikke M. Nielsen was present during Run 1 (22 October 2026). Run 2 (23 October 2026) was carried out by Evgeniy Shkondin alone. Report updated on 27 October 2026. | Experimental work and documentation: '''Evgeniy Shkondin, DTU Nanolab'''. Rikke M. Nielsen was present during Run 1 (22 October 2026). Run 2 (23 October 2026) was carried out by Evgeniy Shkondin alone. Report updated on 27 October 2026. | ||
Service and target loading: <b>Henrik Nielsen (DTU Nanolab)</b> | |||
Photographs and schematics: Evgeniy Shkondin / DTU Nanolab. The power and rate plots are reconstructed from the instrument recordings. Both runs used a HULA (high uniformity lift-off assembly) holder; film thicknesses were determined by Cauchy-model ellipsometry. | Photographs and schematics: Evgeniy Shkondin / DTU Nanolab. The power and rate plots are reconstructed from the instrument recordings. Both runs used a HULA (high uniformity lift-off assembly) holder; film thicknesses were determined by Cauchy-model ellipsometry. | ||
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'''Note.''' This report records exploratory tests rather than an operating instruction. Source coverage must be assessed during deposition; the absence of damage in one run does not establish that continued operation after breakthrough is acceptable. Use the current local operating procedures and tool-responsible guidance [2 | '''Note.''' This report records exploratory tests rather than an operating instruction. Source coverage must be assessed during deposition; the absence of damage in one run does not establish that continued operation after breakthrough is acceptable. Use the current local operating procedures and tool-responsible guidance [1, 2]. | ||
=== Related local documentation === | === Related local documentation === | ||