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Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/SiO2 disk and granule source tests in Temescal October 2026: Difference between revisions

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Experimental work and documentation: '''Evgeniy Shkondin, DTU Nanolab'''. Rikke M. Nielsen was present during Run 1 (22 October 2026). Run 2 (23 October 2026) was carried out by Evgeniy Shkondin alone. Report updated on 27 October 2026.
Experimental work and documentation: '''Evgeniy Shkondin, DTU Nanolab'''. Rikke M. Nielsen was present during Run 1 (22 October 2026). Run 2 (23 October 2026) was carried out by Evgeniy Shkondin alone. Report updated on 27 October 2026.
Service and target loading: <b>Henrik Nielsen (DTU Nanolab)</b>


Photographs and schematics: Evgeniy Shkondin / DTU Nanolab. The power and rate plots are reconstructed from the instrument recordings. Both runs used a HULA (high uniformity lift-off assembly) holder; film thicknesses were determined by Cauchy-model ellipsometry.
Photographs and schematics: Evgeniy Shkondin / DTU Nanolab. The power and rate plots are reconstructed from the instrument recordings. Both runs used a HULA (high uniformity lift-off assembly) holder; film thicknesses were determined by Cauchy-model ellipsometry.
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Four solid SiO<sub>2</sub> disks alone, used with a small circular sweep, developed a cavity through the full source stack during the nominal 600 nm test. The recording captures strong early rate excursions and a late transient. The heating-timer pauses are a separate operational issue and are not evidence of source instability. The liner was reported undamaged.
Four solid SiO<sub>2</sub> disks alone, used with a small circular sweep, developed a cavity through the full source stack during the nominal 600 nm test. The recording captures strong early rate excursions and a late transient. The heating-timer pauses are a separate operational issue and are not evidence of source instability. The liner was reported undamaged.


The combination of disks, surrounding granules and a horizontal figure-eight sweep gave more stable operation in the second test and left the fourth disk unpenetrated. Both configurations produced transparent SiO<sub>2</sub> films with Cauchy-model ellipsometry thicknesses close to 0.67 µm. The combined configuration is a reasonable starting point for further source optimization.
<b><em>The combination of disks, surrounding granules, and a horizontal figure-eight sweep gave more stable operation in the second test and left the fourth disk unpenetrated.</em></b>
 
Both configurations produced transparent SiO<sub>2</sub> films with Cauchy-model ellipsometry thicknesses close to 0.67 µm. The combined configuration is a reasonable starting point for further source optimization.


The strongest evidence supports improved deposition stability and reduced penetration depth in Run 2. Lower mass consumption was not quantified because the second charge was not weighed before and after deposition. A reliable maximum thickness requires further testing.
The strongest evidence supports improved deposition stability and reduced penetration depth in Run 2. Lower mass consumption was not quantified because the second charge was not weighed before and after deposition. A reliable maximum thickness requires further testing.




'''Note.''' This report records exploratory tests rather than an operating instruction. Source coverage must be assessed during deposition; the absence of damage in one run does not establish that continued operation after breakthrough is acceptable. Use the current local operating procedures and tool-responsible guidance [2, 3].
'''Note.''' This report records exploratory tests rather than an operating instruction. Source coverage must be assessed during deposition; the absence of damage in one run does not establish that continued operation after breakthrough is acceptable. Use the current local operating procedures and tool-responsible guidance [1, 2].
 
== Experimental record and scope ==
 
=== Experimental record ===
 
[1] Evgeniy Shkondin, DTU Nanolab. Temescal SiO<sub>2</sub> source tests, 22-23 October 2026: experimental observations, source photographs and schematics, Cauchy-model ellipsometry results and source-mass measurements. Rikke M. Nielsen was present during Run 1; Run 2 was carried out by Evgeniy Shkondin alone.
 
[4] “2610229.dlg”: Run 1 instrument recording, 22 October 2026. [5] “2610234.dlg”: Run 2 instrument recording, 23 October 2026. Their dates and 6.000 kÅ / 1.0 Å/s settings match the tests. The power and rate curves are reconstructed from these files.
 
[6] Source-material package labels: ScoTech silicon dioxide disks, 21 mm diameter × 5 mm thick, 99.99% (4N), tracking number 2702/SiO2; Umicore Thin Film Products AG silicon dioxide granulate, 1.5-3.5 mm, 99.99%, product code 0481889. Photographs of both labels accompany the report package.
 
=== Setup and observation record ===
 
A HULA (high uniformity lift-off assembly) holder was used in both runs. The SiO<sub>2</sub> film thicknesses were obtained by Cauchy-model ellipsometry. Figure 5 records visual mental descriptions through the top chamber window, where brightness, contrast and shadowing affect interpretation. Final penetration depths were established after venting.


=== Related local documentation ===
=== Related local documentation ===


[2] DTU Nanolab LabAdviser, “Temescal processing / Good to know about the Temescal”. QCM conversion, tooling calibration and source monitoring. Accessed 27 October 2026.
[1] DTU Nanolab LabAdviser, “Temescal processing / Good to know about the Temescal”. QCM conversion, tooling calibration and source monitoring. Accessed 27 October 2026.


[https://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Thin_film_deposition/Temescal/Good_to_know_about_the_Temescal Open the Temescal process-control guide]
[https://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Thin_film_deposition/Temescal/Good_to_know_about_the_Temescal Open the Temescal process-control guide]


[3] DTU Nanolab LabAdviser, “Evaporation of SiO<sub>2</sub> in Temescal-2”. Related local process information, accessed 27 October 2026. Its earlier tests are separate from this comparison.
[2] DTU Nanolab LabAdviser, “Evaporation of SiO<sub>2</sub> in Temescal-2”. Related local process information, accessed 27 October 2026. Its earlier tests are separate from this comparison.


[https://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_Silicon_Oxide/Deposition_of_SiO2_in_E-Beam_Evaporator_Temescal-2 Open the related SiO<sub>2</sub> deposition page]
[https://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_Silicon_Oxide/Deposition_of_SiO2_in_E-Beam_Evaporator_Temescal-2 Open the related SiO<sub>2</sub> deposition page]
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