Specific Process Knowledge/Thin film deposition/Deposition of Silicon Nitride/Deposition of Silicon Nitride using PECVD: Difference between revisions
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'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_Silicon_Nitride/Deposition_of_Silicon_Nitride_using_PECVD click here]''' <br> | |||
At the moment DTU Nanolab has 2 PECVDs that can | |||
=Deposition of Silicon Nitride using PECVD= | |||
At the moment DTU Nanolab has 2 PECVDs that can deposit silicon nitride and silicon oxynitride. PECVD4 is for clean silicon based and III-V based samples. PECVD3 is for silicon based samples but here up 5% (4 cm2) wafer coverage of other materials as metals are allowed (under some conditions even more). Look at the [[Specific Process Knowledge/Thin film deposition/PECVD|PECVD]] page to learn more about the PECVDs at DTU Nanolab. All though PECVD3 and PECVD4 are very much alike you cannot count on the a recipe on one system will give exactly the same results on the other system. | |||
== Deposition of SiN with PECVD4 == | == Deposition of SiN with PECVD4 == | ||
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*[http://labmanager.dtu.dk/d4Show.php?id= | *[http://labmanager.dtu.dk/d4Show.php?id=5093&mach=395 The QC procedure for PECVD4 - requires login]<br> | ||
*[ | *[https://labmanager.dtu.dk/view_binary.php?type=data&mach=395 The newest QC data for PECVD4 - requires login]<br> | ||
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<nowiki>*</nowiki> Due to recent oscillations on the QC nitride recipe (HF), new tests were performed. Learn more about it under [[Deposition of SiN with PECVD4/NEW TESTS QC|NEW TESTS QC]] . (Still under development.) | |||
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==Recipes on PECVD3 for deposition of silicon nitride | ==Recipes on PECVD3 for deposition of silicon nitride== | ||
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*[http://labmanager | *[http://labmanager.dtu.dk/d4Show.php?id=1402&mach=106 The QC procedure for PECVD3 - requires login]<br> | ||
*[ | *[https://labmanager.dtu.dk/view_binary.php?type=data&mach=106 The newest QC data for PECVD3 - requires login]<br> | ||
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===Recipes=== | ===Recipes=== | ||
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==Recipes on PECVD2 for | ==Recipes on PECVD2 for Deposition of Silicon Nitride== | ||
'''<span style="color:Red">Expired Recipes! The PECVD2 has been decomissioned and is no longer available.</span>''' | |||
===Recipes=== | ===Recipes=== | ||
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==Recipes on PECVD1 for Deposition of Silicon Nitride== | |||
'''<span style="color:Red">Expired Recipes! The PECVD1 has been decomissioned and is no longer available.</span>''' | |||
==Recipes on PECVD1 for | |||
===Recipes=== | ===Recipes=== | ||
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=Oxynitrides= | |||
The recipe for making oxynitrides will depend on what kind of oxynitride you need. If you need a little higher refractive index than SiO2 then start with an SiO2 recipe and then add NH3 until the right refractive index is obtained. If you need very high refractive index a little lower than for silicon nitride then it is probably better to start with a silicon nitride recipe and add a some N2O until you get the right refractive index. | |||
We had a Ph.d student long time ago Klaus Bo Mogensen that did the first. You can find his ph.d. thesis here: [https://findit.dtu.dk/en/catalog?author=Mogensen&q=title%3A%28Integration+of+Planar+Waveguides+for+Optical+Detection+in+Microfabricated+Analytical+Devices%29 Integration of Planar Waveguides for Optical Detection in Microfabricated Analytical Devices] | |||
Berit H. has the thesis in her office. | |||