Jump to content

Specific Process Knowledge/Thin film deposition/Deposition of Silicon Nitride/Deposition of Silicon Nitride using PECVD: Difference between revisions

← Older edit
VisualWikitext
Bghe (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
7,324 edits
Bghe (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
7,324 edits
 
(42 intermediate revisions by 5 users not shown)
Line 1: Line 1:
'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_Silicon_Nitride/Deposition_of_Silicon_Nitride_using_PECVD click here]'''
{{cc-nanolab}}


'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_Silicon_Nitride/Deposition_of_Silicon_Nitride_using_PECVD click here]''' <br>


At the moment DANCHIP has 2 PECVDs that can deposite silicon nitride and silicon oxynitride. PECVD4 is for clean silicon based and III-V based samples. PECVD3 is for silicon based samples but here up 5% (4 cm2) wafer coverage of other materials as metals are allowed. Look at the [[Specific Process Knowledge/Thin film deposition/PECVD|PECVD]] page to learn more about the PECVDs at DANCHIP. All though PECVD3 and PECVD4 are very much alike you cannot count on the a recipe on one system will give exactly the same results on the other system.
 
=Deposition of Silicon Nitride using PECVD=
 
At the moment DTU Nanolab has 2 PECVDs that can deposit silicon nitride and silicon oxynitride. PECVD4 is for clean silicon based and III-V based samples. PECVD3 is for silicon based samples but here up 5% (4 cm2) wafer coverage of other materials as metals are allowed (under some conditions even more). Look at the [[Specific Process Knowledge/Thin film deposition/PECVD|PECVD]] page to learn more about the PECVDs at DTU Nanolab. All though PECVD3 and PECVD4 are very much alike you cannot count on the a recipe on one system will give exactly the same results on the other system.


== Deposition of SiN with PECVD4 ==
== Deposition of SiN with PECVD4 ==
{| border="1" cellspacing="2" cellpadding="2" colspan="3"
{| border="1" cellspacing="2" cellpadding="2" colspan="3"
|bgcolor="#98FB98" |'''Quality Controle (QC) for PECVD4 [[Image:section under construction.jpg|70px]] '''
|bgcolor="#98FB98" |'''Quality Control (QC) for PECVD4 '''
|-
|-
|
|
*[http://labmanager.danchip.dtu.dk/d4Show.php?id=1402&mach=395 The QC procedure for PECVD4]<br>
*[http://labmanager.dtu.dk/d4Show.php?id=5093&mach=395 The QC procedure for PECVD4 - requires login]<br>
*[http://www.labmanager.danchip.dtu.dk/view_binary.php?type=data&mach=106 The newest QC data for PECVD3]<br>
*[https://labmanager.dtu.dk/view_binary.php?type=data&mach=395 The newest QC data for PECVD4 - requires login]<br>
{| {{table}}
{| {{table}}
| align="center" |  
| align="center" |  
Line 16: Line 20:


! QC Recipe:
! QC Recipe:
! QCNITRIDE
! QCNITRIDE=HFSIN
|-  
|-  
| SiH<sub>4</sub> flow
| SiH<sub>4</sub> flow
Line 40: Line 44:
!PECVD4
!PECVD4
|-
|-
|Depoition rate
|Deposition rate
|~ 11.6 nm/min
|11.0-13.2 nm/min
|-
|-
|Non-uniformity
|Non-uniformity
Line 47: Line 51:
|-
|-
|Refractive Index
|Refractive Index
|1.996 - 2.018
|1.988 - 2.018
|}
|}
|-
|-
|}
|}
|}
|}
<nowiki>*</nowiki> Due to recent oscillations on the QC nitride recipe (HF), new tests were performed. Learn more about it under [[Deposition of SiN with PECVD4/NEW TESTS QC|NEW TESTS QC]] . (Still under development.)




Line 76: Line 82:
|-
|-
|MF SIN<!-- Recipe -->
|MF SIN<!-- Recipe -->
|12.9-13.0 nm/min<!-- Dep. rate [nm/min] -->
|12.9-13.0 nm/min <br> 11.7 nm/min (''kabi 2019-03-01'')<!-- Dep. rate [nm/min] -->
|2.038-2.044<!-- RI -->
|2.038-2.044<!-- RI -->
|&plusmn; 1.7%<!-- Unif. [%] -->
|&plusmn; 1.7%<!-- Unif. [%] -->
Line 90: Line 96:
|<!-- Tune -->
|<!-- Tune -->
|10:00/60:00(stress)<!-- Time [mm:ss] -->
|10:00/60:00(stress)<!-- Time [mm:ss] -->
|February 2017 bghe<!--Tested -->
|February 2017 Berit Herstrøm @DTU Nanolab (bghe)<!--Tested -->
|-
|-
|MF SIN2<!-- Recipe -->
|44.3 nm/min <!-- Dep. rate [nm/min] -->
|2.01-2.02 <!-- RI -->
|&plusmn; 2.7%<!-- Unif. [%] -->
|? MPa <!-- Stress [MPa] -->
|<!-- Comments -->
|30<!-- SiH4 [sccm] -->
|30<!-- NH3 [sccm] -->
|<!-- N2O [sccm] -->
|1470<!-- N2 [sccm] -->
|850 mTorr<!-- Pressure [mTorr] -->
|100HF8.2"/100LF2.2"<!-- Power [W] -->
|<!-- Load -->
|<!-- Tune -->
|10:00<!-- Time [mm:ss] -->
|February 2020 bghe<!--Tested -->
|-
|-
|LF SIN<!-- Recipe -->
|LF SIN<!-- Recipe -->
Line 133: Line 157:
<br clear="all" />
<br clear="all" />


==Recipes on PECVD3 for deposition of silicon nitride and silicon oxynitride==
==Recipes on PECVD3 for deposition of silicon nitride==


{| border="1" cellspacing="2" cellpadding="2" colspan="3"
{| border="1" cellspacing="2" cellpadding="2" colspan="3"
Line 139: Line 163:
|-
|-
|
|
*[http://labmanager.danchip.dtu.dk/d4Show.php?id=1402&mach=106 The QC procedure for PECVD3]<br>
*[http://labmanager.dtu.dk/d4Show.php?id=1402&mach=106 The QC procedure for PECVD3 - requires login]<br>
*[http://www.labmanager.danchip.dtu.dk/view_binary.php?type=data&mach=106 The newest QC data for PECVD3]<br>
*[https://labmanager.dtu.dk/view_binary.php?type=data&mach=106 The newest QC data for PECVD3 - requires login]<br>
{| {{table}}
{| {{table}}
| align="center" |  
| align="center" |  
Line 171: Line 195:
!PECVD3
!PECVD3
|-
|-
|Depoition rate
|Deposition rate
|~40 nm/min
|~40 nm/min
|-
|-
Line 183: Line 207:
|}
|}
|}
|}


===Recipes===
===Recipes===
Line 253: Line 276:
|~2.1 (''bghe Feb 2016'')
|~2.1 (''bghe Feb 2016'')
|~?
|~?
|[[/PECVD3: Low stress nitride testing|see DOE]]  
|[[/PECVD3: Low stress nitride testing|see more results]]  
|-
|-
|MFSiNLS
|MFSiNLS
Line 284: Line 307:
|}
|}


 
==Recipes on PECVD2 for Deposition of Silicon Nitride==
==Recipes on PECVD2 for deposition of silicon nitride and silicon oxynitride ==
'''<span style="color:Red">Expired Recipes! The PECVD2 has been decomissioned and is no longer available.</span>'''
===Recipes===
===Recipes===
{| border="1" cellspacing="0" cellpadding="7"
{| border="1" cellspacing="0" cellpadding="7"
Line 367: Line 390:
|}
|}


 
==Recipes on PECVD1 for Deposition of Silicon Nitride==
 
'''<span style="color:Red">Expired Recipes! The PECVD1 has been decomissioned and is no longer available.</span>'''
 
==Recipes on PECVD1 for deposition of silicon nitride and silicon oxynitride. <span style="color:Red">Expired!</span>:PECVD1 has been decommissioned==
===Recipes===
===Recipes===
{| border="1" cellspacing="0" cellpadding="7"
{| border="1" cellspacing="0" cellpadding="7"
Line 428: Line 449:
|-
|-
|}
|}
=Oxynitrides=
The recipe for making oxynitrides will depend on what kind of oxynitride you need. If you need a little higher refractive index than SiO2 then start with an SiO2 recipe and then add NH3 until the right refractive index is obtained. If you need very high refractive index a little lower than for silicon nitride then it is probably better to start with a silicon nitride recipe and add a some N2O until you get the right refractive index.
We had a Ph.d student long time ago Klaus Bo Mogensen that did the first. You can find his ph.d. thesis here: [https://findit.dtu.dk/en/catalog?author=Mogensen&q=title%3A%28Integration+of+Planar+Waveguides+for+Optical+Detection+in+Microfabricated+Analytical+Devices%29 Integration of Planar Waveguides for Optical Detection in Microfabricated Analytical Devices]
Berit H. has the thesis in her office.
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_Silicon_Nitride/Deposition_of_Silicon_Nitride_using_PECVD"