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'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/LabAdviser/Technology_Research/Ice_Lithography_for_Advanced_Nanofabrication click here]'''
'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/LabAdviser/Technology_Research/Ice_Lithography_for_Advanced_Nanofabrication click here]'''


=Organic Ice Resists for Electron-Beam Lithography - Instrumentation and Processes=
=Organic Ice Resists for Electron-Beam Lithography - Instrumentation and Processes=
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*'''Project responsible:''' William Tiddi ([http://orbit.dtu.dk/en/persons/william-tiddi(7603153a-3652-4965-8e92-62b3a5deb499).html DTU Orbit])
*'''Project responsible:''' William Tiddi ([http://orbit.dtu.dk/en/persons/william-tiddi(7603153a-3652-4965-8e92-62b3a5deb499).html DTU Orbit])
*'''Supervisors:''' Assoc. Prof. Marco Beleggia, Assist. Prof. Anpan Han
*'''Supervisors:''' Assoc. Prof. Marco Beleggia, Assist. Prof. Anpan Han
*'''Partners involved:''' DTU Danchip/Cen
*'''Partners involved:''' DTU Nanolab (former DTU Danchip/DTU Cen)
*'''Full thesis:''' [[:File:PhDthesisPapers_v2.pdf|Link]]
*'''Full thesis:''' [[:File:PhDthesisPapers_v2.pdf|Link]]
*'''Overview:''' [[/Electron-Beam Lithography on Organic Ice Resists|Electron-Beam Lithography on Organic Ice Resists]]
*'''Overview:''' [[/SEM-LEO Customizations for Organic Ice Resists|SEM-LEO Customizations for Organic Ice Resists]]


==Project Description==
==Project Description==
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Ice lithography is a nanopatterning technique derived from electron beam lithography, showing feature resolution below 10nm. A thin water ice layer condensed on the sample takes the role of the lithographic resist film when exposed to electron or ion beams. This process is immensely cheaper and more sustainable than state-of-the-art techniques relying on physical masks and aggressive chemistries.
Ice lithography is a nanopatterning technique derived from electron beam lithography, showing feature resolution below 10nm. A thin water ice layer condensed on the sample takes the role of the lithographic resist film when exposed to electron or ion beams. This process is immensely cheaper and more sustainable than state-of-the-art techniques relying on physical masks and aggressive chemistries.


At DTU Danchip/Cen, we investigate ice lithography and the steps it needs to be ported from research to future industry, establishing its potential as the break-through technology needed to advance further in the ultra large scale integration semiconductor roadmap.
We investigate ice lithography and the steps it needs to be ported from research to future industry, establishing its potential as the break-through technology needed to advance further in the ultra large scale integration semiconductor roadmap.


Want to know more?
Want to know more?
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