Specific Process Knowledge/Thin film deposition/Furnace LPCVD PolySilicon/Boron doped poly-Si and a-Si: Difference between revisions
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==Boron-doped amorphous silicon by using 4" LPCVD polysilicon furnace (B4) == | ==Boron-doped amorphous silicon by using 4" LPCVD polysilicon furnace (B4) == | ||
''Result from Thomas Pedersen, | ''Result from Thomas Pedersen, DTU Nanotech (now DTU Nanolab), September 2015'' | ||
====Process parameters==== | ====Process parameters==== | ||