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Specific Process Knowledge/Characterization/SEM LEO: Difference between revisions

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In her later years the SEM LEO was equipped with a Raith e-beam lithography system and was exclusively dedicated to the users of the Raith E-beam lithography.
In her later years the SEM LEO was equipped with a Raith e-beam lithography system and was exclusively dedicated to the users of the Raith E-beam lithography.
== Performance==
*[[Specific Process Knowledge/Characterization/SEM: Scanning Electron Microscopy|SEM comparison page]]
*[[Specific Process Knowledge/Lithography/EBeamLithography/RaithElphy|Raith Elphy e-beam lithography system]]


===Typical current values for EBL===
===Typical current values for EBL===
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