Specific Process Knowledge/Characterization/SEM Supra 3: Difference between revisions
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|style="background:LightGrey; color:black"|Batch size | |style="background:LightGrey; color:black"|Batch size | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*Up to 6" wafer with full view | *Up to 4" wafer with full view | ||
*Up to 6" wafer with full view, requires rotation of the wafer | |||
|- | |- | ||
| style="background:LightGrey; color:black"|Allowed materials | | style="background:LightGrey; color:black"|Allowed materials | ||