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Specific Process Knowledge/Back-end processing/Laser Micromachining Tool: Difference between revisions

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info about new laser source
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The machine is located in the basement of building 346 under the cleanroom.
The machine is located in the basement of building 346 under the cleanroom.
'''The machine was upgraded with a high power femtosecond laser in January 2025.'''
The information about the lasers below is therefor outdated. Those laser have been removed.
The page will be updated very soon.


'''The user manual(s), user APV(s), technical information and contact information can be found in LabManager:'''  
'''The user manual(s), user APV(s), technical information and contact information can be found in LabManager:'''  
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* 1064nm, F255mm: 41 W
* 1064nm, F255mm: 41 W
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* [[media:AvgPower_1064nm_F255mm.png|Graph 1064nm, F255nm Avg. output power]]
* [[index.php?title=Media:AvgPower 1064nm F255mm.png|Graph 1064nm, F255nm Avg. output power]]
* [[media:AvgPower_355nm_F103mm.png|Graph 355nm, F103nm Avg. output power]]
* [[index.php?title=Media:AvgPower 355nm F103mm.png|Graph 355nm, F103nm Avg. output power]]


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|style="background:LightGrey; color:black"|[[media:140618_AverageOutputPower_IPG.jpg|Output power@100%(laser IPG – nanosecond)]]
|style="background:LightGrey; color:black"|[[index.php?title=Media:140618 AverageOutputPower IPG.jpg|Output power@100%(laser IPG – nanosecond)]]
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
Repetition rate : 10kHz to 100kHz (Currently non-available)
Repetition rate : 10kHz to 100kHz (Currently non-available)
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| 1  
| 1  
| N/A
| N/A
| [[media:Dicing_Si_532nm_f255mm.xls|Silicon dicing green parameters]]
| [[index.php?title=Media:Dicing Si 532nm f255mm.xls|Silicon dicing green parameters]]
| Easily break silicon in cristal plan. Depth of the groove : 25µm  
| Easily break silicon in cristal plan. Depth of the groove : 25µm  
|- style="background:LightGray;text-align:center" valign="top"
|- style="background:LightGray;text-align:center" valign="top"
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| 4  
| 4  
| 50 µm
| 50 µm
| [[media:TB_1064nm_255mm_cutting_Si_Si3N4.xls|Silicon nitride cutting parameters]]
| [[index.php?title=Media:TB 1064nm 255mm cutting Si Si3N4.xls|Silicon nitride cutting parameters]]
| Samples can easily be removed with a soft mechanical pressure. A layer of resist can be deposited on the top without influenced the dicing. Thicker layers (oxyde or nitride) have not been tested.
| Samples can easily be removed with a soft mechanical pressure. A layer of resist can be deposited on the top without influenced the dicing. Thicker layers (oxyde or nitride) have not been tested.
|-
|-
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| 1  
| 1  
| N/A
| N/A
| [[media:TB_532nm_255mm_cutting_Ni_320um.xls|Cutting Ni 320µm parameters]]
| [[index.php?title=Media:TB 532nm 255mm cutting Ni 320um.xls|Cutting Ni 320µm parameters]]
| Cutting through only blue tape left  
| Cutting through only blue tape left  
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|-
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| 13   
| 13   
| 20 µm
| 20 µm
| [[media:TB_1064nm_255mm_cutting_pyrex_microfluidic_hole.xls|Cutting Pyrex 1000µm for microfluidic hole parameters]]
| [[index.php?title=Media:TB 1064nm 255mm cutting pyrex microfluidic hole.xls|Cutting Pyrex 1000µm for microfluidic hole parameters]]
| Increase/decrease the number of iteration to increase/decrease the width of the hole. [[media:pyrex_10um_hole_chanel.jpg|Microscope view of the chanel ]]
| Increase/decrease the number of iteration to increase/decrease the width of the hole. [[index.php?title=Media:Pyrex 10um hole chanel.jpg|Microscope view of the chanel]]
|-
|-
|- style="background:LightGray;text-align:center" valign="top"
|- style="background:LightGray;text-align:center" valign="top"
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| 4
| 4
| 20 µm
| 20 µm
| [[media:TB_1064nm_255mm_cutting_Pyrex_525um.xls|Cutting Pyrex 525µm parameters]]
| [[index.php?title=Media:TB 1064nm 255mm cutting Pyrex 525um.xls|Cutting Pyrex 525µm parameters]]
| Cutting through. Dicing circle. Can probably be optimized: 3 lines may be enough and half the iterations (tried by Azeem)
| Cutting through. Dicing circle. Can probably be optimized: 3 lines may be enough and half the iterations (tried by Azeem)
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|-
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|  
|  
|  
|  
| [[media:TB_532nm_255mm_cutting_shim_steel_50um.xls|Cutting steel 50µm]]
| [[index.php?title=Media:TB 532nm 255mm cutting shim steel 50um.xls|Cutting steel 50µm]]
| Cutting shrim for Injection molder.  
| Cutting shrim for Injection molder.  
|-
|-
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|  
|  
|  
|  
| [[media:TB_532nm_255mm_cutting_shim_steel_100um.xls|Cutting steel 100µm]]
| [[index.php?title=Media:TB 532nm 255mm cutting shim steel 100um.xls|Cutting steel 100µm]]
| Cutting shrim for Injection molder.  
| Cutting shrim for Injection molder.  
|-
|-
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|  
|  
|  
|  
| [[media:TB_532nm_255mm_cutting_shim_steel_200um.xls|Cutting steel 200µm]]
| [[index.php?title=Media:TB 532nm 255mm cutting shim steel 200um.xls|Cutting steel 200µm]]
| Cutting shrim for Injection molder.  
| Cutting shrim for Injection molder.  
|-
|-
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| 4
| 4
| 20
| 20
| [[media:Shaddowmask_al_lambda_532nm,_F_255mm.xls‎|cutting Al 400µm]]
| [[index.php?title=Media:Shaddowmask al lambda 532nm, F 255mm.xls|cutting Al 400µm]]
| Cutting shadowmask for Wordentec.  
| Cutting shadowmask for Wordentec.  
|-
|-
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| 4
| 4
| 40
| 40
| [[media:Aluminium_cut_IPG Lambda 1064nm, F 255mm.xls‎|cutting Al 600µm]]
| [[index.php?title=Media:Aluminium cut IPG Lambda 1064nm, F 255mm.xls|cutting Al 600µm]]
| Shadowmask.   
| Shadowmask.   
|}
|}