Specific Process Knowledge/Lithography/Descum: Difference between revisions
| Line 97: | Line 97: | ||
=Plasma Asher 4= | =Plasma Asher 4= | ||
Product name: PVA Tepla Gigabatch 380M<br> | |||
Year of purchase: 2024 | |||
Descum of AZ 5214E on 100 mm wafers. The descum process development was done for a single substrate, as well as 3 substrates (for decreased ashing rate and improved ashing uniformity). The substrates were placed vertically in the glass boat. | Descum of AZ 5214E on 100 mm wafers. The descum process development was done for a single substrate, as well as 3 substrates (for decreased ashing rate and improved ashing uniformity). The substrates were placed vertically in the glass boat. | ||