File:WF 2E08a 23mar2011-060.jpg: Difference between revisions
Etching of nanostructures in Si using DRIE-Pegasus: nano1.42 recipe, Run ID 2017, time 120 secs, SF6 38, C4F8 75, 4mtorr, 800/40 coil/platen, -20 degs. |
(No difference)
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Etching of nanostructures in Si using DRIE-Pegasus: nano1.42 recipe, Run ID 2017, time 120 secs, SF6 38, C4F8 75, 4mtorr, 800/40 coil/platen, -20 degs. |
(No difference)
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