Specific Process Knowledge/Lithography/EBeamLithography/EBLProcessExamples: Difference between revisions
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Example of shot placement. Left: The shot placement does not form an equidistant grid since the beam pitch does not fit an integer number of beam shots in the 4x4 µm subfield. Right: The beam pitch matches the subfield size and beam shots are placed in a perfect grid. | Example of shot placement. Left: The shot placement does not form an equidistant grid since the beam pitch does not fit an integer number of beam shots in the 4x4 µm subfield (indicated with dashed lines). Right: The beam pitch matches the subfield size and beam shots are placed in a perfect grid. | ||
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