Specific Process Knowledge/Lithography/EBeamLithography/JEOLPatternPreparation: Difference between revisions
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Some steps are done using Beamer from GenISys GmbH. We advise all users to familiarise themselves with Beamer [https://www.genisys-gmbh.com/webinar-series-beamer-training.html through the tutorial series found on GenISys own website.] or from our own [[Specific_Process_Knowledge/Lithography/EBeamLithography/BEAMER|Beamer guide.]] | Some steps are done using Beamer from GenISys GmbH. We advise all users to familiarise themselves with Beamer [https://www.genisys-gmbh.com/webinar-series-beamer-training.html through the tutorial series found on GenISys own website.] or from our own [[Specific_Process_Knowledge/Lithography/EBeamLithography/BEAMER|Beamer guide.]] | ||
Please observe that for wafer exposure on JEOL 9500, the wafer is clamped such that it is not possible to expose the rim of the wafer. The patternable diameter for wafers are: | |||
*2": 44 mm | |||
*4": 93 mm | |||
*6": 138 mm | |||
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