Specific Process Knowledge/Lithography/EBeamLithography/JEOL Compilation Computer: Difference between revisions
Appearance
| Line 32: | Line 32: | ||
The JCC has two important differences from the JEOL 9500 exposure system: | The JCC has two important differences from the JEOL 9500 exposure system: | ||
# | #Not all condition files found on the control computer will be present on the JCC. To get accurate meaningful calculations of shot time and execution time you should however keep the STDCUR at the intended beam current in the JDF file. Remember to change the CALPRM command when transfering the files to the JEOL 9500 system. | ||
#The JCC is | #The minimum shot time on the JCC is 10 ns, while it i 5 ns on the system itself. Thus for pre compilation on the JCC you must use a shot pitch high enough to satisfy that condition. The shot pitch does not affect the writing time estimate. | ||