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Specific Process Knowledge/Lithography/EBeamLithography/JEOL Compilation Computer: Difference between revisions

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The JCC has two important differences from the JEOL 9500 exposure system:
The JCC has two important differences from the JEOL 9500 exposure system:


#It only has a single working condition file (CALPRM) and that is '''2na_ap4'''. Thus it is necesarry to compile with this condition file in all sequences of the SDF file. To get accurate meaningful calculations of shot time and execution time you should however keep the STDCUR at the intended beam current in the JDF file. Remember to change the CALPRM command when transfering the files to the JEOL 9500 system.
#Not all condition files found on the control computer will be present on the JCC. To get accurate meaningful calculations of shot time and execution time you should however keep the STDCUR at the intended beam current in the JDF file. Remember to change the CALPRM command when transfering the files to the JEOL 9500 system.
#The JCC is slower than the JEOL 9500 computer. Hence for large V30 files it is quite slow and one should consider going to the cleanroom and compile on the JEOL 9500 computer instead.
#The minimum shot time on the JCC is 10 ns, while it i  5 ns on the system itself. Thus for pre compilation on the JCC you must use a shot pitch high enough to satisfy that condition. The shot pitch does not affect the writing time estimate.