Specific Process Knowledge/Lithography/EBeamLithography/Dose Testing: Difference between revisions
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Content and illustration by Thomas Pedersen, DTU Nanolab unless otherwise noted. | |||
=Introduction= | =Introduction= | ||
In E-beam lithography it is often necesarry to do a dose test in order to get the required result. In a dose test one will expose critical parts of a pattern with various doses and determine the best dose by SEM analysis of the final pattern. There are several ways to set up a dose test array on the JEOL system, in this section we will describe four different setups, each with their own benefits and drawbacks. | In E-beam lithography it is often necesarry to do a dose test in order to get the required result. In a dose test one will expose critical parts of a pattern with various doses and determine the best dose by SEM analysis of the final pattern. There are several ways to set up a dose test array on the JEOL system, in this section we will describe four different setups, each with their own benefits and drawbacks. | ||
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Example frome ChipPlace definine a 10 x 2 element dose matrix with relative doses from 1 to 2, ready for export to V30 | Example frome ChipPlace definine a 10 x 2 element dose matrix with relative doses from 1 to 2, ready for export to V30. | ||
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