Specific Process Knowledge/Lithography/EBeamLithography/Dose Testing: Difference between revisions
| Line 239: | Line 239: | ||
The number of doses for dose testing is controlled by the parameter '''m''' while the increase in dose between doses is defined by '''modulation''', it is a percentwise change relative to the base dose. For instance, if one wants to do a dose test with 200 µC/cm<sup>2</sup> as base dose in steps of 10 µC/cm<sup>2</sup> one would set '''modulation = 5'''. | The number of doses for dose testing is controlled by the parameter '''m''' while the increase in dose between doses is defined by '''modulation''', it is a percentwise change relative to the base dose. For instance, if one wants to do a dose test with 200 µC/cm<sup>2</sup> as base dose in steps of 10 µC/cm<sup>2</sup> one would set '''modulation = 5'''. | ||
The output is a single JDI file containing all modulation tables named '''MODx''', where x is a running number from 1 to '''m'''. The array and reference to each modulation table can then be set up in the JDF file as seen below. | The output is a single JDI file containing all modulation tables named '''MODx''', where x is a running number from 1 to '''m'''. The array and reference to each modulation table can then be set up in the JDF file as seen below. It is convenient to use the include command '''@''' to reference the JDI file itself rather than copy-paste the tables into the JDF. | ||
<pre> | <pre> | ||