Specific Process Knowledge/Etch/DRIE-Pegasus/DREM/DREM 2kW micro: Difference between revisions
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|Resist etch rate: 62 nm/min [http://labmanager.dtu.dk/function.php?module=Processlog&view=editlog&usageid=384373 Process log entry] | |Resist etch rate: 62 nm/min [http://labmanager.dtu.dk/function.php?module=Processlog&view=editlog&usageid=384373 Process log entry] | ||
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