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Specific Process Knowledge/Thin film deposition/Cluster-based multi-chamber high vacuum sputtering deposition system: Difference between revisions

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→Process information: removed names and software images from public versions of acceptance and preacceptance tests
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Additional information about the processes and equipment performace can be found here:
Additional information about the processes and equipment performace can be found here:


*Pre-acceptance test [[:File:Cluster Lesker P1 and P3 Pre-acceptance test FOR LA PUBLICATION.pdf]]
*Pre-acceptance test [[:File:Cluster-based multi-chamber high vacuum sputtering deposition system pre acceptance.pptx]]
or you can see the [https://labmanager.dtu.dk/view_binary.php?fileId=5556 full pre-acceptance test] including software images in LabManager (requires login)


*Acceptance test [[:File:Cluster Lesker P1 and P3 Acceptance test FOR LA PUBLICATION.pdf]]
*Acceptance test [[:File:Cluster Lesker P1 and P3 Acceptance test FOR LA PUBLICATION.pdf]]
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Thin_film_deposition/Cluster-based_multi-chamber_high_vacuum_sputtering_deposition_system"