Specific Process Knowledge/Thin film deposition/Cluster-based multi-chamber high vacuum sputtering deposition system: Difference between revisions
Appearance
No edit summary |
|||
| (One intermediate revision by the same user not shown) | |||
| Line 428: | Line 428: | ||
Additional information about the processes and equipment performace can be found here: | Additional information about the processes and equipment performace can be found here: | ||
*Pre-acceptance test [[ | *Pre-acceptance test [[:File:Cluster-based multi-chamber high vacuum sputtering deposition system pre acceptance.pptx]] | ||
*Acceptance test [[ | *Acceptance test [[:File:Cluster Lesker P1 and P3 Acceptance test FOR LA PUBLICATION.pdf]] | ||