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<i> Unless otherwise stated, this page is written by <b>DTU Nanolab internal</b><br>
<i> Unless otherwise stated, this page is written by <b>DTU Nanolab internal</b><br>
All images and photos on this page belonges to <b>DTU Nanolab</b></i>.<br>
All images and photos on this page belonges to <b>DTU Nanolab</b></i>.<br>


[[Category: Equipment|Thin film Sputter deposition Lesker]]
[[Category: Equipment|Thin film Sputter deposition Lesker]]
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Additional information about the processes and equipment performace can be found here:
Additional information about the processes and equipment performace can be found here:


*Pre-acceptance test [[Media:Cluster-based multi-chamber high vacuum sputtering deposition system pre acceptance.pptx]]
*Pre-acceptance test [[:File:Cluster-based multi-chamber high vacuum sputtering deposition system pre acceptance.pptx]]


*Acceptance test [[Media:Cluster-based multi-chamber high vacuum sputtering deposition system Acceptance.pptx]]
*Acceptance test [[:File:Cluster Lesker P1 and P3 Acceptance test FOR LA PUBLICATION.pdf]]




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