Specific Process Knowledge/Thin film deposition/Cluster-based multi-chamber high vacuum sputtering deposition system: Difference between revisions
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'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/Cluster-based_multi-chamber_high_vacuum_sputtering_deposition click here]''' | '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/Cluster-based_multi-chamber_high_vacuum_sputtering_deposition click here]''' | ||
<i> Unless otherwise stated, this page is written by <b>DTU Nanolab internal</b></i> | <i> Unless otherwise stated, this page is written by <b>DTU Nanolab internal</b><br> | ||
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[[Category: Equipment|Thin film Sputter deposition Lesker]] | [[Category: Equipment|Thin film Sputter deposition Lesker]] | ||
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Additional information about the processes and equipment performace can be found here: | Additional information about the processes and equipment performace can be found here: | ||
*Pre-acceptance test [[ | *Pre-acceptance test [[:File:Cluster-based multi-chamber high vacuum sputtering deposition system pre acceptance.pptx]] | ||
*Acceptance test [[ | *Acceptance test [[:File:Cluster Lesker P1 and P3 Acceptance test FOR LA PUBLICATION.pdf]] | ||