Specific Process Knowledge/Etch/III-V RIE: Difference between revisions
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*20 cm | *20 cm | ||
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| style="background:LightGrey; color:black"| | | style="background:LightGrey; color:black"|Material allowed | ||
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* III-V compound semiconductors | * III-V compound semiconductors | ||
* Silicon based materials | |||
* Photoresist/e-beam resist | |||
* BCB | |||
*Photoresist/e-beam resist | * For other materials, please ask | ||
* | |||
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