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File:BGE GLass etch Cr50Au400n1 pinholes 05.jpg: Difference between revisions

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15min HF 40% etch of borofloat with 50/400 nm Cr/Au mask made in the Alcatel E-beam evaporator. Resist for masking the Cr/Au etch has been left on and baked at 120 degrees of ½ hour. The image is taken where I found some pinholes.
 
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