Specific Process Knowledge/Lithography/Resist/DUVresist: Difference between revisions
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'''Positive DUV resist for spin coating in 1600-800nm thickness range:''' | '''Positive DUV resist for spin coating in 1600-800nm thickness range:''' | ||
*[[ | *Manufacturers website: [https://www.jsrmicro.be/semiconductor/lithography/jsr-krf-photoresists KrF M35G] | ||
*Datasheet: [https://labmanager.dtu.dk/view_binary.php?class=MiscDocument&id=4&name=datasheet+M35G.pdf KrF M35G] - '''requires login''' | |||
'''Negative DUV resist for spin coating in 1400-800nm or diluted with EC Solvent in 1:1 in 400-200nm thickness range:''' | '''Negative DUV resist for spin coating in 1400-800nm or diluted with EC Solvent in 1:1 in 400-200nm thickness range:''' | ||
*[[Media:UVN2300.pdf|UVN2300-0.8]]. | *[[Media:UVN2300.pdf|UVN2300-0.8]]. | ||