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Specific Process Knowledge/Lithography/Resist/DUVresist: Difference between revisions

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Jehem (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, danchip
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'''Positive DUV resist for spin coating in 600-300nm thickness range:'''
'''Positive DUV resist for spin coating in 600-300nm thickness range:'''
*[[Media:M230Y_PSM_annular_130C_PEB.pdf|KRF M230Y]]
*Manufacturers website: [https://www.jsrmicro.be/semiconductor/lithography/jsr-krf-photoresists KrF M230Y]
*Datasheet: [https://labmanager.dtu.dk/view_binary.php?class=MiscDocument&id=4&name=datasheet+M230Y.pdf KrF M230Y] - '''requires login'''




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