Specific Process Knowledge/Thin film deposition/Deposition of Titanium Nitride: Difference between revisions
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* 0.0232 nm/cycle on a high aspect ratio structures | * 0.0232 nm/cycle on a high aspect ratio structures | ||
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* | * about 7 nm/min, depends on sputtering parameters, check processlog in LabManager | ||
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* up to 0.0625 nm/s on a flat sample | * up to 0.0625 nm/s on a flat sample | ||