Jump to content

Specific Process Knowledge/Characterization/Optical characterization/advanced ellipsometry: Difference between revisions

← Older editNewer edit →
VisualWikitext
Bghe (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
7,301 edits
No edit summary
Bghe (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
7,301 edits
No edit summary
Line 7: Line 7:
*Phase analysis of ”non-ideal” thin films
*Phase analysis of ”non-ideal” thin films
*Thickness mapping (for its own sake and for resistivity mapping)
*Thickness mapping (for its own sake and for resistivity mapping)
*All-optical determination of electrical properties of transparent conductive materials
*All-optical determination of electrical properties of transparent conductive materials.
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Characterization/Optical_characterization/advanced_ellipsometry"