Specific Process Knowledge/Etch/Etching of Silicon/Si etch using ASE: Difference between revisions
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This recipe is intended to only for low etch depths that are not very critical with regards to eg. the sidewall profile. For deep etching of silicon you will need to use the bosch process and the coil power. | This recipe is intended to only for low etch depths that are not very critical with regards to eg. the sidewall profile. For deep etching of silicon you will need to use the bosch process and the coil power. | ||
Recipe name in the ASE: "1si_rie1" | ''' Recipe name in the ASE: "1si_rie1" ''' | ||
{| border="1" cellspacing="1" cellpadding="1" align="left" | {| border="1" cellspacing="1" cellpadding="1" align="left" | ||
! Wafer ID | ! Wafer ID | ||