Specific Process Knowledge/Etch/DRIE-Pegasus/DUVetch/polySOI10: Difference between revisions
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|+ '''Process runs''' | |||
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! rowspan="2" width="40"| Date | |||
! colspan="4" width="120"| Substrate Information | |||
! colspan="4" | Process Information | |||
! rowspan="2" width="500" |SEM Images | |||
|- | |||
! width="30" | Wafer info | |||
! width="40" | Mask | |||
! width="40" | Material/ Exposed area | |||
! width="40" | Tool / Operator | |||
! width="40" | Conditioning | |||
! width="40" | Recipe | |||
! width="40" | Wafer ID | |||
! width="40" | Comments | |||
|- | |||
| 6/5-2013 | |||
| 1/4 1/4 6" ELK stitching 11/1-2013 CB on oxide carrier | |||
| standard stepper mask (50 nm barc + 320 nm krf) | |||
| Si / 50%+ | |||
| Pegasus / jmli | |||
| 3min TDESC clean + 30 sec barc etch | |||
| polySOI5 , 50 cycles or 6:15 minutes | |||
| S003472 | |||
| | |||
| | |||
[[File:S003472-1.jpg|120px|frameless ]] | |||
[[File:S003472-2.jpg|120px|frameless ]] | |||
[[File:S003472-3.jpg|120px|frameless ]] | |||
[[File:S003472-4.jpg|120px|frameless ]] | |||
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[[File:S003472-7.jpg|120px|frameless ]] | |||
|- | |||
| 16/7-2013 | |||
| 1/4 6" ELK stitching 11/1-2013 CB on oxide carrier | |||
| standard stepper mask (50 nm barc + 320 nm krf) | |||
| Si / 50%+ | |||
| Pegasus/jmli | |||
| 3 minute TDESC clean + 30 second barc etch | |||
| jml/SOI3/polySOI-10: 50 cycles or 6:15 minutes | |||
| S003614 | |||
| lsh: c4f8 etch -> 20 | |||
| | |||
[[file:Peg-S003614_06.jpg |120px|frameless ]] | |||
[[file:Peg-S003614_07.jpg |120px|frameless ]] | |||
[[file:Peg-S003614_08.jpg |120px|frameless ]] | |||
[[file:Peg-S003614_09.jpg |120px|frameless ]] | |||
[[file:Peg-S003614_10.jpg |120px|frameless ]] | |||
[[file:Peg-S003614_11.jpg |120px|frameless ]] | |||
|- | |||
| 23/8-2013 | |||
| 1/4 6" tigre 400 nm pitch pattern CB on oxide carrier | |||
| standard stepper mask (50 nm barc + 320 nm krf) | |||
| Si / 50 % in 20*20 mm squares | |||
| Pegasus / jmli | |||
| 10 minute TDESC clean + 30 second barc etch | |||
| jml/SOI3/polySOI-10: 100 cycles or 12:30 minutes | |||
| S003695 | |||
| | |||
| | |||
[[file:S03695-01.jpg |120px|frameless ]] | |||
[[file:S03695-02.jpg |120px|frameless ]] | |||
[[file:S03695-03.jpg |120px|frameless ]] | |||
[[file:S03695-04.jpg |120px|frameless ]] | |||
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[[file:S03695-06.jpg |120px|frameless ]] | |||
[[file:S03695-07.jpg |120px|frameless ]] | |||
|- | |||
| 15/5-2014 | |||
| 6" DUV Lithography test pattern | |||
| standard stepper mask (50 nm barc + 320 nm krf) | |||
| Si / 50 % in 20*20 mm squares | |||
| Pegasus / jmli | |||
| 10 minute TDESC clean + 30 second barc etch | |||
| jml/SOI3/polySOI-10: 50 cycles or 6:15 minutes + 2 mins gentle PR strip | |||
| S004031 | |||
| | |||
| | |||
[[file:S004031-04.jpg |120px|frameless ]] | |||
[[file:S004031-edge-05.jpg |120px|frameless ]] | |||
[[file:S004031-edge-06.jpg |120px|frameless ]] | |||
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[[file:S004031-edge-08.jpg |120px|frameless ]] | |||
[[file:S004031-edge-09.jpg |120px|frameless ]] | |||
[[file:S004031-01.jpg |120px|frameless ]] | |||
[[file:S004031-02.jpg |120px|frameless ]] | |||
[[file:S004031-03.jpg |120px|frameless ]] | |||
|- | |||
! colspan="10" | [[Main Page/Process Logs/jmli/Pegasus/SOI/polySOI10-b | Later runs of this recipe]] | |||
|- | |||
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|+ '''Process runs''' | |+ '''Process runs''' | ||