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Specific Process Knowledge/Lithography/Resist/UVresist/exposureDoseNaOH: Revision history

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12 January 2026

  • curprev 10:4910:49, 12 January 2026 Jehem talk contribs 2,493 bytes +10 No edit summary
  • curprev 10:4610:46, 12 January 2026 Jehem talk contribs 2,483 bytes +36 No edit summary
  • curprev 10:4510:45, 12 January 2026 Jehem talk contribs 2,447 bytes +2,447 Created page with "The exposure doses listed below are for ''generic'' good exposure results, and can be a compromise between getting good lines, as well as good dots, in both clear field and dark field exposures. The optimal dose for any given specific project, could be different from the listed values. All doses are for standard silicon wafers, unless otherwise stated. Development is done using AZ 351B developer (NaOH) diluted 1:5. ===Aligner: MA6-1=== The Aligner: MA6-1 has an i-line..."
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