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Specific Process Knowledge/Etch/Titanium Nitride/ICP metal: Revision history

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29 August 2025

  • curprev 11:5411:54, 29 August 2025 Prakus talk contribs 937 bytes +937 Created page with " == Etching of Titanium nitride with resist as masking material - on 6" carrier wafer == This recipe was adapted from Evgeniy Shkondin recipe from 2018. This recipe is still under investigation. {| border="2" cellspacing="2" cellpadding="3" !Parameter !A Etch with carrier |- |Coil Power [W] |500 |- |Platen Power [W] |10 |- |Platen temperature [<sup>o</sup>C] |0 |- |Cl<sub>2</sub> flow [sccm] |5 |- |Ar flow [sccm] |5 |- |Pressure [mTorr] |10 |- |} {| border="2" cel..."
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