Specific Process Knowledge/Lithography/EBeamLithography/JEOL Processes

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Large area circle arrays

Arrays of circles can naturally be exposed by exposing a pattern that consists of circles. In this scheme each circle will consist of a number of beam shots to fill the shape of each circle. For large areas this can however be very time consuming and pattern files can become very large. Hence, in this work we investigate a different approach. In this approach each circle will be defined by a single beam shot and the circle diameter will be controlled by the dwell time of that single beam shot. In this approach the dwell time for each beam shots will be much longer than for usual pattern writing but there will be much fewer beam shots.